Chemical cleaning is a method, which is used to derive surfaces and walls of equipment, pipelines, vessels, kettles and heat exchangers of unwanted contaminants. It also means the purification, conditioning, treatment or disinfections of water. This process is used for passivation to eliminate fouling, oxidation, process system corrosion, and decontamination of process lines and vessels.

Chemical design software is a molecular design system focusing on the generation and screening of new molecular structures. It can automatically construct new chemicals and predicts their macroscopic physical properties.

Chemical etching equipment performs chemical dry etching of thin film on a semiconductor wafer in gaseous state. Damage-free etching process through perfect separation of the etching unit and plasma-generating unit enables wide use in the damage removal process.

Chemical feed pumps are generally positive displacement pumps (also called piston pumps). These pumps displace, or push out, a volume of chemical equal to the volume of the piston. The length of the piston, called the stroke, can be lengthened or shortened to increase or decrease the amount of chemical delivered by the pump. Each stroke of a piston pump displaces or pushes chemical out.